The “NNV-2” plant is intended for ion-plasma deposition of coatings on various products in a vacuum, the formation of transition layers between the base and the coating, the deposition of erosion-resistant and wear-resistant coatings, and the modification of materials and products.
The following processes are executed in one cycle:
- ion-plasma cleaning and activation of product surfaces;
- ion-plasma application of functional coatings;
- formation of a strengthened nitrided sublayer.

The “NNV-2” plant consists of the following main components:
− Chamber;
− Door;
− Frame;
− Evaporator (3 pcs.);
− Vacuum system;
− Rotator;
− Trolley;
− Pneumatic system;
− Water cooling system;
− Gas injection system;
− Control cabinet;
− Power cabinet;
− Electrical wiring;
− Protective screens.

The working chamber has a hexagonal shape. The chamber has a water cooling system. Three planar evaporators, a vacuum system pipe and an external pyrometer are installed on the sides of the chamber. One face is made in the form of a flange for loading and unloading of processed products.
The chamber is closed by a sliding door with a cooling jacket.
The door moves on a trolley along the frame guides. A working chamber is also installed on the frame. The trolley is driven by an asynchronous electric motor through a gear motor. The speed of door movement is controlled by a frequency drive.
A rotator with 12 spindles is mounted on the door in a cantilever for installing equipment with workpieces. The spindle rotates through a sealed lead from a gearmotor with an asynchronous electric motor. The spindle rotation speed is controlled by a frequency drive.

A planetary mechanism is located in the center of the vacuum chamber, and evaporators are installed along its perimeter. To pre-clean and activate the surface of the substrates, the chamber is equipped with an ion source and a heating element. With uniform heating of rotating parts, water and hydrocarbon compounds evaporate and the mobility of surface atoms and molecules increases. To clean the surface from oxide film and other relatively thermally stable contaminants, it is treated with an ion beam with an energy of 1–1.5 keV coming from an ion source, and pre-treatment of the surface in a vacuum significantly improves the adhesion of the protective film. This plant is used in industrial production for applying various types of coatings.

Process gases are released through a 3-channel digital gas leak with a vacuum gauge, which is installed in the power cabinet.
Temperature control is carried out using a pyrometer and a thermocouple installed on the rotator.

In physical deposition (PVD), the coating material changes from a solid state to a gas phase as a result of evaporation under the influence of thermal energy or as a result of atomization due to the kinetic energy of the collision of material particles. Coatings are applied using the PVD method at temperatures up to 450°C, which practically does not impose restrictions on the materials used to which the coating is applied. PVD processes are carried out in a vacuum or in a working gas atmosphere at a fairly low pressure - about 10^-2mbar). This is necessary to facilitate the transfer of particles from the source (target) to the product (substrate) with a minimum number of collisions with atoms or gas molecules. The same condition determines the obligatory direct flow of particles. As a result, the coating is applied only to that part of the product that is oriented towards the particle source. The rate of deposition depends on the relative location of the source and the material. For uniform coating application, systematic movement of material or the use of several, specifically located, sources is necessary. At the same time, since the coating is applied only to surfaces "in the direct line of sight of the source", the method allows selective coating of only certain parts of the surface, leaving others without a coating. The main factors determining the quality of a coating applied by physical deposition are the purity of the starting materials and reaction gas, as well as the required vacuum level.

The processes take place in an inert gas environment in the presence of a reaction gas (for example, nitrogen and/or acetylene) at a negative bias voltage across the coated material.
The thickness of the coating is determined by the consumption of the evaporated substance from the moment the evaporator dampers open.